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Sponsors &
Committees
 The EIPBN Conference is incorporated as a
non-profit organization in the State of New Jersey and is co-sponsored
by the American
Vacuum Society in cooperation with the IEEE Electron Devices Society and
the Optical
Society of America.
Funding for EIPBN,
including scholarships for student participation, has been provided by:
Conference Chair
J. Alexander Liddle
EIPBN 2007
c/o Widerkehr and Associates
Suite 312
16220 South Frederick Av
Gaithersburg MD 20877
jalEIPBN2007@comcast.net
Program Chair
Gregory Wallraff
IBM Almaden Research Center
San Jose CA 95120
Phone: 408 927 2503
Fax: 408 927 3310
gmwall@almaden.ibm.com
Affiliates
Program
Affliliates program brochure
(pdf)
Corporate sponsors
EIPBN has a long tradition of corporate support.
Indeed, we rely on the generosity of our corporate affiliates to help
us provide a first-rate conference. We will make your corporate name
prominent on our web site, in our mailings, and throughout the
conference.
Contributions are at your discretion, but two
special programs are available:
Corporate Sponsor (sponsor a coffee hour or other
event) cost: $2,500
Corporate Benefactor (sponsor a major conference event) cost: $5,000
Other types
of sponsorship are also available: logo merchandise distribution,
preferred booth locations, and so on. Please refer to the Affiliates program brochure
for more information.
Student
support
It is of paramount importance to get as many
students as possible to attend EIPBN. Presenting a conference paper is
a momentous occasion for a student - many of us remember our first
published paper (perhaps not without some relief, tempered by
consternation). Equally important is the broad view and unique
perspective EIPBN provides to young professionals. In addition the
conference provides a useful job forum, of benefit to students and
prospective employers alike.
Students receive a special conference rate, made
possible by your contribution. EIPBN sponsors a student breakfast,
where students have the opportunity to meet with professionals from
industry, academia, and government, including prospective employers.
All students and student sponsors are invited to the breakfast. The
students also provide assistance at the technical sessions, and other
conference functions.
Student support cost: $ 2,500
How to enroll
You can enroll in our Affiliates programs using this link to online
registration, or by contacting the Conference Chair or Program Chair
(contact information above). A check drawn to EIPBN2006 can be mailed
directly to the Conference Chair. Alternatively, electronic payment
information can be obtained by contacting the Conference Chair. We at
EIPBN strongly and enthusiastically encourage your organization to
participate in any or all of our Affiliates programs!
Steering
Committee
S. Brueck, S. Chou, E. Dobisz, R.
Engelstad, C.
Hanson, J. A.
Liddle, S.
Palmer, M.
Peckerar, S.
Wind, G.
M. Wallraff
Advisory
Committee
| N. Economou |
D. J. Ehrlich |
T. E. Everhart |
M. Gesley |
T. R. Groves |
| L. R. Harriott |
M. Hatzakis |
F. Hohn |
R. E. Howard |
E. L. Hu |
| J. Kelly |
D. P. Kern |
R. L. Kubena |
R. Kunz |
N. MacDonald |
| C. R. K. Marrian |
S. Matsui |
M. McCord |
J. Melngailis |
A. Neureuther |
| A. Novembre |
J. Orloff |
G. Owen |
S. Pang |
R. F. Pease |
| H. C. Pfeiffer |
J. N. Randall |
D. Resnick |
M. L. Schattenburg |
H. I. Smith |
| L. W. Swanson |
D. Tennant* |
L. F. Thompson |
G. Varnell |
R. Viswanathan |
| A. Wagner |
J. C. Wiesner |
C. D. W. Wilkinson |
A. D. Wilson |
E. D. Wolf |
| J. C. Wolfe |
K. Cummings |
W. D. Meisburger |
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*Financial Trustee
Section Heads
| Electron
Beam Lithography |
A. Brodie, E.
Kratschmer, J. A. Liddle, S. Rishton |
| Emerging Topics |
S. Y. Chou, L. J.
Guo, C. Hanson, M. Horn, P. Nealey, M. Reed, C. D. W. Wilkinson, G.
Willson |
EUV
Lithography
|
K. Goldberg, S.
Hector, S. Okazaki, P. J. S. Mangat, D. Sweeney |
| Ion
Beam Nanofabrication |
W. Bruenger, S.
Matsui, H. Loeschner |
| Masks |
U. Behringer, W.
Dauksher, J. Hartley, J. Maldonado, K. Nordquist, D. P. Mathur |
| Nanometrology
and Alignment |
D. Herr, D. Joy, M.
Postek, P. Russell |
| Nanotechnology
Fabrication |
E. Anderson, T. K.
Higman, M. Rooks, H. Smith, S. Spector |
| Nanotechnology
Devices |
K. Berggren, J.R.A.
Cleaver, D. Tanenbaum, K. Wilder-Gaurini |
| Optical
Lithography |
S. Brueck, T.
Brunner, M. Fritze, M. Rothschild, A. Yen |
| Photon
and Charged Particle Optics |
Z. W. Chen, L.
Scipioni, P. Kruit, E. Munro |
| Resists |
M. Angelopoulos,
T. Fedynyshyn, G. Wallraff |
| X-ray
Lithography |
K. Brown, F.
Cerrina, M. Feldman, T. Kitayama, R. Selzer |
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