EIPBN  
 

 

Program

Presentation Instructions: Advice for Authors (pdf)

Complete Program for EIPBN2007 (pdf)

Plenary Session

Prof. C. Grant Willson University of Texas at Austin
http://willson.cm.utexas.edu/

Step and Flash Imprint Lithography: A Status Report   
Prof. Tom Russell University of Massachusetts Amherst
http://www.pse.umass.edu/faculty/russell.html

Nondisruptive Lithographic Processes on the Nanoscopic Level   
Jeff Welser Director - SRC Nanotechnology Research Inititive
http://www.nanotechwire.com/news.asp?nid=3578

The Semiconductor Industry's Nanoelectronics Research Initiative: Motivation and Challenges   
Don Eigler IBM Almaden Research Center
http://www.almaden.ibm.com/almaden/media/eigler2.html

Spin Excitation Spectroscopy with the STM   
Prof. Nader Engheta University of Pennsylvania
http://www.ese.upenn.edu/~engheta/

Metamaterial and Plasmonic Nanocircuit Elements: Towards a New Paradigm for Optical Nanoelectronics   


Invited Speakers (partial list)


Timothy Brunner
IBM Microelectronics
Current issues and trends in lithography for advanced chip production
David Joy
University of Tennessee
Does the SEM have a future in Metrology ?
P. James Schuck
Molecular Foundry, LBNL
Toward nano-scale optical lithography: Utilizing the near-field of bowtie optical nanoantennas.
Konstantin Likharev
Stony Brook University
CMOL: Freeing Advanced Lithography from the Alignment Requirement Terror
Bruno La Fontaine
AMD
EUV Lithography: From Research to Manufacturing
Michael Kozicki 
Arizona State University
Highly Scalable Resistance-Change Memory
Adam Cohen
Stanford University
Trapping and manipulating single molecules in solution
Delia Milliron
IBM Almaden Research Center
The Push for Cost Effective Solar Photovoltaics, an Opportunity for Nanomaterials
Karl K. Berggren
MIT
Superconducting Nanodevices for Single-Photon Detection
Harry Atwater   
Caltech
Plasmonics: A Route to Optical Metamaterials and Nanoscale Optical Devices   
John Rogers   
University of Illinois
Techniques for Three Dimensional and Molecular Scale Fabrication   
Delia Milliron   
IBM Almaden Research Center
The Push for Cost Effective Solar Photovoltaics, an Opportunity for Nanomaterials   
Gregory Cooper   
Pixelligent Inc
Reversible Contrast Enhancement Layer (CEL) for 193 nm Lithography    
Paul W.K. Rothemund   
California Institute of Technology
DNA origami: folding DNA to create arbitrary shapes and patterns   
Mark Hart   
IBM Almaden Research Center
Step-and-Flash Imprint Lithography for Storage-Class Memory   
Glenn McGall   
Affymetrix
Photolithographic Synthesis of High-Density DNA Probe Arrays: Challenges and Opportunities   
Natsuhiko Mizutani   
Canon Research Center
A Challenge to half-pitch 22 nm using Near-field Lithography   
Paul Nealey   
University of Wisconsin
Exploring the manufacturability of using block copolymers as resist materials in conjunction with advanced lithographic tools 
Solomon Assefa   
IBM TJ Watson Research Center
Spin-Torque Switching in MgO-based Magnetic Tunnel Junctions for Next Generation Non-Volatile Memory Applications   
Irene Fernandez-Cuesta
Centro Nacional de Microelectronica
V-groove plasmonic waveguides fabricated by NanoImprint Lithography
Leon Bellan
Cornell University
Multi-component solutions as tools to study electrospinning jet dynamics
Brian Cord
MIT
Investigation of Very Low Temperature Development of PMMA