EIPBN  
 

 

EIPBN

The EIPBN Conference is recognized as the foremost international meeting dedicated to lithographic science and technology and its application to micro and nanofabrication techniques. The conference brings together engineers and scientists from industries and universities from all over the world to discuss recent progress and future trends.

We are pleased to feature the following paper on the history of the EIPBN conference:

History of the “Three Beams” Conference, the Birth of the Information Age
and the Era of Lithography Wars

Mark L. Schattenburg
Space Nanotechnology Laboratory, Massachusetts Institute of Technology


Another item of historical interest is Richard Feynman's 1959 lecture



Meeting Format

The conference opens on Tuesday afternoon with a special commercial session which features vendors of materials and equipment relevant to this conference. The plenary session is on Wednesday morning. The rest of the conference has two parallel sessions. The length of presentation is 30 minutes for invited papers and 20 minutes for contributed papers, discussion time included. A special feature of the technical program is the poster session that includes invited and contributed papers. There is only one poster session, but posters will be displayed for informal viewing throughout the entire conference. No distinction is made between the importance of poster and oral presentations.

Technical Scope

Abstracts representing high quality original research are invited in the following areas:

DUV, immersion, EUV and X-ray lithography

Electron and ion beam lithography

Sub-half wavelength "super resolution" optical lithography

Photon- and charged-particle optics

Metrology and alignment

Resists and resist processing

Plasma etching and deposition

Nanofabrication techniques

Topics in nanofabrication and emerging technologies include:

Simulation and computer aided design for the Nanoscale Era

Molecular nanoelectronics

Bio-nanotechnology & hybrid bio/solid state devices

Micro and nanoscaled MEMS

Nanoimprint lithography and embossing

Atom and molecule manipulation

Conference Chair

J. Alexander Liddle
EIPBN 2007
c/o Widerkehr and Associates
Suite 312
16220 South Frederick Av
Gaithersburg MD 20877
jalEIPBN2007@comcast.net


Program Chair

Gregory Wallraff
IBM Almaden Research Center
San Jose CA 95120
Phone: 408 927 2503
Fax:  408 927 3310
gmwall@almaden.ibm.com

Meeting arrangements

Meeting arrangements by JEM Meetings, who have arranged the EIPBN meetings since 1995. Call JEM at 914-659-6144 or jemmtgs@optonline.net for all your conferencing needs.

 

Shipping

Please refer to our "travel" page for shipping instructions.

 

Related Conferences

Conferences of similar interest are held in the Fall in Europe (MNE) and in Japan (MNC). Check out our "sister conferences" with these links:

MNE 2007

International Microprocess and Nanotechnology Conference, Japan

Gordon Research Conferences

Student Support


Limited funds are available to support student travel. The Conference Chair must receive a request for support from the student's advisor by May 1. Decisions about student support will be returned by May 15. Students receiving support must submit a manuscript, and preference will be given to students who are both first author and presenter. (At EIPBN there is no distinction between oral and poster presentations.)




 

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